Scalable metrology for semiconductor manufacturing

Purpose and goal:

Advances in semiconductor manufacturing at the leading edge are increasingly challenged by the need for metrology that is both precise and scalable as feature sizes continue to shrink (Moore’s Law). This project is dedicated to advancing Dappler Labs’ innovative, energy-efficient, and ultra-scalable dimensional metrology solution leveraging cost-effective and fast optical wafer inspection tools.

Expected results and effects:

We will validate sensitivity of our solution to several nanoscale dimensional metrology parameters of interest to potential customers. The core-functionality of our software product will be developed and released to pilot customers. Approach and implementation:

We will test different semiconductor patterning processes and benchmark our metrology against SEM using the nanofabrication facilities at KTH. We will further expand our network in the semiconductor industry for future industrial validation.