Green CVD method for metal deposition

Purpose and goal:

A new time-resolved CVD method has been developed by Ionautics and researchers at LiU. This e-CVD method uses free electrons in a plasma for surface chemical redox reactions to synthesize metallic films. Real-time film growth data has been sampled and used for a better understanding and control of the film deposition, both for self-limiting as well as area-selective deposition. The method is implemented in a scalable coating system.

Expected results and effects:

The here-realized time-resolved e-CVD process is based on sequentially exposing the surface (substrate) to precursor molecules and plasma in pulsed intervals. We have verified the net growth of the desired metal films and studied the growth mechanisms in the various steps using a new time-resolved diagnostic tool. Suitable pulse configurations have been identified, enabling coatings with better properties. A scientific publication has been submitted in collaboration with LiU.

Approach and implementation:

The project enabled us to develop a new pulsed plasma technology (process + hardware) for thin film synthesis. We were also able to formalize a collaboration with researchers at LiU, which enabled the project outcomes described above. The researchers at LiU also pointed out appropriate areas of use (when to use and when not to use this technology), which is extremely valuable in our marketing and further development of this technology.