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| Funder | European Commission |
|---|---|
| Recipient Organization | Interuniversitair Micro-Electronica Centrum |
| Country | Belgium |
| Start Date | Oct 01, 2024 |
| End Date | Sep 30, 2028 |
| Duration | 1,460 days |
| Number of Grantees | 16 |
| Roles | Participant; Coordinator; Associated Partner |
| Data Source | European Commission |
| Grant ID | 101189797 |
Building on the foundation of the 2D-Experimental Pilot line project (2D-EPL), the 2D-Pilot line project, 2D-PL, has the ambition to further strengthen the European ecosystem in the development of the relevant integration modules for offering prototyping services in the field of photonics and electronics, working on the maturation of the technology, and providing essential information aiding industrial uptake.
The main objective of the pilot line is to further mature 2DM fabrication in an industrially relevant FAB environment to secure the 2D pilot line access.
The service offerings include the preparation of relevant process design kits (PDKs) and multi-project wafer (MPW) run offerings, which are an essential part of this project's outreach plan.
The large application space for 2DM and the broad differentiation for material property requirements make the development of such a pilot line very challenging.
Therefore, within the scope of the 2D-PL project, the focus for module maturation is tailored towards the photonic and electronic devices and circuits reaching academic institutions, research centres, SMEs, and larger businesses.
Akhetonics Gmbh; Suss Microtec Solutions Gmbh & Co Kg; Ihp Gmbh - Leibniz Institute for High Performance Microelectronics; Ev Group E. Thallner Gmbh; Nederlandse Organisatie Voor Toegepast Natuurwetenschappelijk Onderzoek Tno; Teknologian Tutkimuskeskus Vtt Oy; Interuniversitair Micro-Electronica Centrum; Qnami Ag; Horiba France Sas; Gesellschaft Fur Angewandte Mikro Und Optoelektronik Mit Beschrankterhaftung Amo Gmbh; Oxford Instruments Nanotechnology Tools Limited; Aixtron Se; Micro Resist Technology Gesellschaft Fuer Chemische Materialien Spezieller Photoresistsysteme Mbh; Graphenea Semiconductor Sl; Stiftelsen Chalmers Industriteknik; Chalmers Tekniska Hogskola Ab
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