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Active HORIZON European Commission

Automated Maskless Laser Lithography Platform for First Time Right Mixed Scale Patterning

€5.62M EUR

Funder European Commission
Recipient Organization Joanneum Research Forschungsgesellschaft Mbh
Country Austria
Start Date Oct 01, 2022
End Date Sep 30, 2026
Duration 1,460 days
Number of Grantees 9
Roles Coordinator; Participant
Data Source European Commission
Grant ID 101057029
Grant Description

Laser-based technologies for creating structures in the range from nanometer up to millimeter size find many applications such as free form optics, photonics, multifunctional surfaces, lab-on-chip, etc. with a global market volume of > 200 billion euros.

The original structures know as masters are the first step in the making of tools for key-enabling technologies like injection molding or nanoimprinting.

Some of the current limitations in the laser lithography processes are the limited depth of the structures, small area and low speed at process level, high-power consumption in the laser interference lithography, and multiple and expensive processes required for the development of hierarchical multifunctional structures at industrial level.The OPTIMAL project will integrate for the first-time different laser lithography technologies, quality monitoring systems and processes in one platform for the development of structures with (i) high depth (150 micrometer), ii) dimensions in the range from 100 nm to sub-mm in XYZ, iii) 2D&3D shape on flat surface, (iv) combining parallel & serial patterning, (v) no need for external treatments on samples; vi) increased speed (1 cm2/min) and large area (up to 2000 cm2), vii) > 40% of reduction in the consumption of resources for the whole manufacturing process.

The OPTIMAL project uses self-learning algorithms to optimize the virtual photomask as well as integrates methods for an inline control of the laser patterning.

By accelerating and upscaling the structuring process, the OPTIMAL project will increase the process efficiency and yield, which will reduce the energy consumption, avoid material waste, decrease costs, and lead time in many applications.

The platform will potentiate the possibilities in the sustainable making of high quality, versatile, less costly masters for industrial manufacturing, as demonstrated in 4 use cases (optical lenses, multifunctional riblet structures, virtual reality lens, microfluidic chips).

All Grantees

Joanneum Research Forschungsgesellschaft Mbh; Universita Degli Studi Di Parma; Deltapix Aps; Sony Dadc Europe Gmbh; Basf Coatings Gmbh; Centrum Vedecko Technickych Informacii Slovenskej Republiky; Hypervision Ltd; Zilinska Univerzita V Ziline; Micro Resist Technology Gesellschaft Fuer Chemische Materialien Spezieller Photoresistsysteme Mbh

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